Tokyo Institute of Technology Hitosugi Lab

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Members

Seoungmin Chon
Name M2 (TAC-MI Registered Student) : Seoungmin Chon
Office Tokyo Tech. Bld. East2-607
Tel (ext) +81-3-5734-3935 (3935)
Email chon.s.aa -at- m.titech.ac.jp
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Research interest

  • Metal nitrohydride
  • Reactive magnetron sputtering
  • Thin film growth

Academic

  • 2017.6: B. S. in Materials Engineering, University of Alberta

Professional experience

  • 2016.1 - 2016.8: Intern metallurgical engineer, Syncrude Canada ltd.

Recent Conference

  • "Epitaxial growth of Ca2NH thin films using reactive magnetron sputtering"

    Seoungmin Chon, Shigeru Kobayashi, Ryota Shimizu, Kazunori Nishio, and Taro Hitosugi
    Materials research meeting 2019 December 10-14, 2019, Yokohama, JPN.

  • "Epitaxial growth of Ca2NH thin films using reactive magnetron sputtering"

    Seoungmin Chon, Shigeru Kobayashi, Kazunori Nishio, Ryota Shimizu, Taro Hitosugi
    The 5th Japan-Korea Joint Symposium on Hydrogen in Materials November 7-8, 2019, Tokyo, JPN.

  • "Epitaxial growth of CaNxHy thin films using reactive magnetron sputtering"

    Seoungmin Chon, Shigeru Kobayashi, Kazunori Nishio, Ryota Shimizu, Taro Hitosugi
    第66回応用物理学会春季学術講演会 2019年3月9-12日 東京工業大学(大岡山キャンパス)

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