Tokyo Institute of Technology Hitosugi Lab

Home > Members > D2:Dai Xin

Members

Dai Xin
Name D2 : Dai Xin
Office Tokyo Tech. Bld. East2-607
Tel (ext) +81-3-5734-3935 (3935)
Email dai.x.ab -at- m.titech.ac.jp
.

Research interest

  • Fluoride thin film
  • Thin film fabrication
  • Solid electrolyte

Academic

  • 2018.6: M. S. in Engineering, Wuhan University of Technology
  • 2016.6: B. S. in Engineering, Wuhan University of Technology

Recent Conference

  • "Growth processes of YF3 epitaxial thin films using fluorine-anion conducting substrates"

    Xin DAI, Yuya Komatsu, Ryota Shimizu, Taro Hitosugi
    第80回応用物理学会秋季学術講演会 2019年9月18-21日 北海道大学(札幌キャンパス)

  • "Fabrication of EuF2 and EuO epitaxial thin films using anion-conducting substrates"

    Xin DAI, Yuya Komatsu, Ryota Shimizu, Taro Hitosugi
    第66回応用物理学会春季学術講演会 2019年3月9-12日 東京工業大学(大岡山キャンパス)

.
.